ELECTRICAL, OPTICAL AND STRUCTURAL PROPERTIES OF UNDOPED AND DOPED AMORPHOUS CARBON THIN FILMS BY BIAS ASSISTED PYROLYSIS-CVD

Amorphous carbon thin films were successfully deposited by the bias assisted thermal-CVD system on insulator glass substrates at various deposition temperatures in the range of 250-550 degree celsius. The deposited amorphous carbon thin films are characterized by using I-V measurement, UV-VIS-NIR sp...

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Main Author: SHAZWANA MOHD SHAH (Author)
Format: Thesis Book
Language:English
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100 0 # |a SHAZWANA MOHD SHAH  |e author 
245 1 0 |a ELECTRICAL, OPTICAL AND STRUCTURAL PROPERTIES OF UNDOPED AND DOPED AMORPHOUS CARBON THIN FILMS BY BIAS ASSISTED PYROLYSIS-CVD  |c SHAZWANA BINTI MOHD SHAH 
264 # 0 |a SHAH ALAM, SELANGOR  |b Universiti Teknologi MARA. Faculty of Applied Sciences  |c 2013 
300 # # |a xii, 75 pages  |b illustrations (some color)  |c 30 cm 
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500 # # |a UiTM X Digitization 
502 # # |a Student report (BSc.)-Universiti Teknologi MARA. Faculty of Applied Science, 2013 
504 # # |a Includes bibliographical references (page 71-75) 
520 # # |a Amorphous carbon thin films were successfully deposited by the bias assisted thermal-CVD system on insulator glass substrates at various deposition temperatures in the range of 250-550 degree celsius. The deposited amorphous carbon thin films are characterized by using I-V measurement, UV-VIS-NIR spectrophotometer and Atomic Force Microscopy (AFM). 
650 # 0 |a Amorphous semiconductors  |x Optical Properties 
710 2 # |a Faculty Of Applied Sciences  |e issuing body 
710 2 # |a Fakulti Sains Gunaan  |e issuing body 
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