COMPARISON OF SINGLE STEP ANNEALING, DOUBLE STEP ANNEALING AND MULTISTEP ANNEALING FOR OXIDE GROWTH ON SILICON BY USING DRY OXIDATION TECHNIQUES

COMPARISON OF SINGLE STEP ANNEALING, DOUBLE STEP ANNEALING AND MULTISTEP ANNEALING FOR OXIDE GROWTH ON SILICON BY USING DRY OXIDATION TECHNIQUES

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Bibliographic Details
Main Author: MUHAMAD ZAKI ABDUL KHALIK (Author)
Format: Thesis
Published: Shah Alam, Selangor Universiti Teknologi MARA. Faculty of Applied Sciences 2010
Online Access:Click Here to View Status and Holdings.
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