COMPARISON OF SINGLE STEP ANNEALING, DOUBLE STEP ANNEALING AND MULTISTEP ANNEALING FOR OXIDE GROWTH ON SILICON BY USING DRY OXIDATION TECHNIQUES
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| Format: | Thesis |
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Shah Alam, Selangor
Universiti Teknologi MARA. Faculty of Applied Sciences
2010
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| Online Access: | Click Here to View Status and Holdings. |
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Hardware annealing in analog VLSI neurocomputing