COMPARISON OF SINGLE STEP ANNEALING, DOUBLE STEP ANNEALING AND MULTISTEP ANNEALING FOR OXIDE GROWTH ON SILICON BY USING DRY OXIDATION TECHNIQUES

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Bibliographic Details
Main Author:	MUHAMAD ZAKI ABDUL KHALIK (Author)
Format:	Thesis
Published:	Shah Alam, Selangor Universiti Teknologi MARA. Faculty of Applied Sciences 2010
Online Access:	Click Here to View Status and Holdings.
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264	#	1	\|a Shah Alam, Selangor \|b Universiti Teknologi MARA. Faculty of Applied Sciences \|c 2010
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