Dry etching for microelectronics

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Bibliographic Details
Other Authors:	Powell, Ronald A
Format:	Unknown
Language:	English
Published:	Amsterdam New York New York, N.Y. North-Holland Physics Pub. Distributors for the USA and Canada, Elsevier Science Pub. Co. 1984
Series:	Materials processing--theory and practices v. 4
Subjects:	Semiconductors > Etching Plasma etching
Online Access:	Click Here to View Status and Holdings.
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MARC


LEADER	00000n a2200000 a 4501
001	wils-84001145
002	000054921
008	940618s1984 ne a b 00110 eng
020	#	#	\|a 0444869050
090	0	0	\|a TK7871.85 \|b .D79 1984
245	1	1	\|a Dry etching for microelectronics \|c edited by Ronald A. Powell
260	#	#	\|a Amsterdam \|a New York \|a New York, N.Y. \|b North-Holland Physics Pub. \|b Distributors for the USA and Canada, Elsevier Science Pub. Co. \|c 1984
300	#	#	\|a xi, 299 p. \|b ill. \|c 24 cm
490	1	#	\|a Materials processing--theory and practices \|v v. 4
500	#	#	\|a Includes index.
504	#	#	\|a Bibliography: p. 223-294.
650	#	1	\|a Semiconductors \|x Etching
650	#	#	\|a Plasma etching
700	1	#	\|a Powell, Ronald A
856	4	0	\|z Click Here to View Status and Holdings. \|u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=84001145
964	#	#	\|c BOK \|d 01
040	#	#	\|a Shah Alam
998	#	#	\|a 00260##a002.8.2\|\|00260##a002.8.2\|\|00260##a002.8.2\|\|00260##b002.8.4\|\|00260##b002.8.4\|\|00260##c002.7.6\|\|00300##a003.4.1\|\|00300##b003.6.1\|\|00300##c003.5.1\|\|00500##a002.17.2\|\|