Study of metal-oxide-semiconductor (MOS) structure characteristics with different annealing temperature

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Bibliographic Details
Main Author:	Siti Fatimah Saipuddin
Corporate Authors:	Research Management Institute (RMI), Institut Pengurusan Penyelidikan
Other Authors:	Ainorkhilah Mahmood, Siti Hajar Khalid, Mohd Hamizan Selamat
Format:	Thesis
Published:	Shah Alam, Selangor Universiti Teknologi MARA. Research Management Institute (RMI) 2012
Subjects:	Metal oxide semiconductors Silicon
Online Access:	Click Here to View Status and Holdings.
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LEADER	00000n a2200000 a 4501
001	wils-552147
040	#	#	\|a ITMB
090	0	0	\|a TK7871 \|b .S58 2012
100	0	#	\|a Siti Fatimah Saipuddin
245	1	0	\|a Study of metal-oxide-semiconductor (MOS) structure characteristics with different annealing temperature \|c Siti Fatimah Saipuddin, Ainorkhilah Mahmood, Siti Hajar Khalid, Mohd Hamizan Selamat
260	#	#	\|a Shah Alam, Selangor \|b Universiti Teknologi MARA. Research Management Institute (RMI) \|c 2012
300	#	#	\|a vii, 39 p. \|b ill \|c 30 cm
500	#	#	\|a Includes bibliographical references
502	#	#	\|a Research report-Universiti Teknologi MARA. Research Management Institute (RMI), 2012
650	#	0	\|a Metal oxide semiconductors
650	#	0	\|a Silicon
700	0	#	\|a Ainorkhilah Mahmood,
700	0	#	\|a Siti Hajar Khalid,
700	0	#	\|a Mohd Hamizan Selamat
710	2	#	\|a Research Management Institute (RMI)
710	2	#	\|a Institut Pengurusan Penyelidikan
856	4	0	\|z Click Here to View Status and Holdings. \|u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=552147
998	#	#	\|a 00130##a006.11\|\|00250##a006.11\|\|00250##b006.11\|\|00255##a006.11\|\|00260##a006.11\|\|00260##b006.11\|\|00260##c006.11\|\|00264#1a006.11\|\|00264#1b006.11\|\|00300##a006.11\|\|00300##b006.11\|\|00300##c006.11\|\|00500##a006.11\|\|00502##a006.11\|\|00520##a006.11\|\|00520##b006.11\|\|00538##a006.11\|\|00546##a006.11\|\|