Study of metal-oxide-semiconductor (MOS) structure characteristics with different annealing temperature

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Bibliographic Details
Main Author:	Siti Fatimah Saipuddin
Corporate Authors:	Research Management Institute (RMI), Institut Pengurusan Penyelidikan
Other Authors:	Ainorkhilah Mahmood, Siti Hajar Khalid, Mohd Hamizan Selamat
Format:	Thesis
Published:	Shah Alam, Selangor Universiti Teknologi MARA. Research Management Institute (RMI) 2012
Subjects:	Metal oxide semiconductors Silicon
Online Access:	Click Here to View Status and Holdings.
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