Computational lithography

Saved in:

Bibliographic Details
Main Author:	Ma, Xu 1983-
Other Authors:	Arce, Gonzalo R.
Format:	Unknown
Published:	Hoboken, NJ Wiley 2010
Series:	Wiley series in pure and applied optics.
Subjects:	Microlithography > Mathematics Integrated circuits > Design and construction > Mathematics Photolithography > Mathematics Semiconductors > Etching > Mathematics Resolution (Optics)
Online Access:	Click Here to View Status and Holdings.
Tags:	Add Tag No Tags, Be the first to tag this record!

MARC


LEADER	00000n a2200000 a 4501
001	wils-450567
020	#	#	\|a 9780470596975 (cloth)
020	#	#	\|a 047059697X (cloth)
040	#	#	\|a DLC \|d ITMB
090	0	0	\|a TK7872.M3 \|b M3 2010
100	1	#	\|a Ma, Xu \|d 1983-
245	1	0	\|a Computational lithography \|c Xu Ma and Gonzalo R. Arce
260	#	#	\|a Hoboken, NJ \|b Wiley \|c 2010
300	#	#	\|a xv, 226 p. \|b ill. \|c 25 cm
490	1	#	\|a Wiley series in pure and applied optics
504	#	#	\|a Includes bibliographical references (p. 217-222) and index
650	#	0	\|a Microlithography \|x Mathematics
650	#	0	\|a Integrated circuits \|x Design and construction \|x Mathematics
650	#	0	\|a Photolithography \|x Mathematics
650	#	0	\|a Semiconductors \|x Etching \|x Mathematics
650	#	0	\|a Resolution (Optics)
700	1	#	\|a Arce, Gonzalo R.
830	#	1	\|a Wiley series in pure and applied optics.
856	4	0	\|z Click Here to View Status and Holdings. \|u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=450567
964	#	#	\|c BOK \|d EE
998	#	#	\|a 00260##a002.8.2\|\|00260##b002.8.4\|\|00260##c002.7.6\|\|00300##a003.4.1\|\|00300##b003.6.1\|\|00300##c003.5.1\|\|