Computational lithography

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Bibliographic Details
Main Author:	Ma, Xu 1983-
Other Authors:	Arce, Gonzalo R.
Format:	Book
Published:	Hoboken, NJ Wiley 2010
Series:	Wiley series in pure and applied optics.
Subjects:	Microlithography > Mathematics Integrated circuits > Design and construction > Mathematics Photolithography > Mathematics Semiconductors > Etching > Mathematics Resolution (Optics)
Online Access:	Click Here to View Status and Holdings.
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