Computational lithography

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Bibliographic Details
Main Author: Ma, Xu 1983-
Other Authors: Arce, Gonzalo R.
Format: Book
Published: Hoboken, NJ Wiley 2010
Series:Wiley series in pure and applied optics.
Subjects:
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Description
Physical Description:xv, 226 p. ill. 25 cm
Bibliography:Includes bibliographical references (p. 217-222) and index
ISBN:9780470596975 (cloth)
047059697X (cloth)