Hf-based high-k dielectrics process development, performance characterization, and reliability

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Bibliographic Details
Main Author:	Kim, Young-Hee 1972-
Other Authors:	Lee, Jack Chung-Yeung
Format:	Unknown
Published:	[San Rafael, Calif.] Morgan & Claypool Publishers 2005
Subjects:	Hafnium oxide > Junctions Integrated circuits > Reliability Breakdown (Electricity) Dielectrics Metal oxide semiconductor field-effect transistors > Reliability Semiconductors > Junctions
Online Access:	Click Here to View Status and Holdings.
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