Hf-based high-k dielectrics process development, performance characterization, and reliability

Saved in:

Bibliographic Details
Main Author:	Kim, Young-Hee 1972-
Other Authors:	Lee, Jack Chung-Yeung
Format:	Book
Published:	[San Rafael, Calif.] Morgan & Claypool Publishers 2005
Subjects:	Hafnium oxide > Junctions Integrated circuits > Reliability Breakdown (Electricity) Dielectrics Metal oxide semiconductor field-effect transistors > Reliability Semiconductors > Junctions
Online Access:	Click Here to View Status and Holdings.
Tags:	Add Tag No Tags, Be the first to tag this record!

Internet