Hf-based high-k dielectrics process development, performance characterization, and reliability

Hf-based high-k dielectrics process development, performance characterization, and reliability

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Bibliographic Details
Main Author: Kim, Young-Hee 1972-
Other Authors: Lee, Jack Chung-Yeung
Format: Unknown
Published: [San Rafael, Calif.] Morgan & Claypool Publishers 2005
Subjects:
Hafnium oxide > Junctions
Integrated circuits > Reliability
Breakdown (Electricity)
Dielectrics
Metal oxide semiconductor field-effect transistors > Reliability
Semiconductors > Junctions
Online Access:Click Here to View Status and Holdings.
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