Hf-based high-k dielectrics process development, performance characterization, and reliability

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Bibliographic Details
Main Author:	Kim, Young-Hee 1972-
Other Authors:	Lee, Jack Chung-Yeung
Format:	Unknown
Published:	[San Rafael, Calif.] Morgan & Claypool Publishers 2005
Subjects:	Hafnium oxide > Junctions Integrated circuits > Reliability Breakdown (Electricity) Dielectrics Metal oxide semiconductor field-effect transistors > Reliability Semiconductors > Junctions
Online Access:	Click Here to View Status and Holdings.
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020	#	#	\|a 1598290045
020	#	#	\|a 9781598293548
040	#	#	\|a WAU \|d ITMB
090	0	0	\|a QC585 \|b .K56 2005
100	1	#	\|a Kim, Young-Hee \|d 1972-
245	1	0	\|a Hf-based high-k dielectrics \|b process development, performance characterization, and reliability \|c Young-Hee Kim, Jack C. Lee
260	#	#	\|a [San Rafael, Calif.] \|b Morgan & Claypool Publishers \|c 2005
300	#	#	\|a x, 92 p. \|b ill. \|c 24cm
504	#	#	\|a Includes bibliographical references
650	#	0	\|a Hafnium oxide \|x Junctions
650	#	0	\|a Integrated circuits \|x Reliability
650	#	0	\|a Breakdown (Electricity)
650	#	0	\|a Dielectrics
650	#	0	\|a Metal oxide semiconductor field-effect transistors \|x Reliability
650	#	0	\|a Semiconductors \|x Junctions
700	1	#	\|a Lee, Jack Chung-Yeung
856	4	0	\|z Click Here to View Status and Holdings. \|u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=406826
964	#	#	\|c BOK \|d 01
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