EFFECTS OF ANNEALING TEMPERATURE AND TIME ON THE SILICON WAFER WITH LIQUID & SOLID DOPANTS
The project is a study the behaviour of N and P-type dopant on silicon wafer by using both liquid and solid dopant sources. For P-type silicon wafer, we doped with Phosphorous while for N-type silicon wafer, we doped with Boron.
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The mechanical properties of metals assessment and significance
