EFFECTS OF ANNEALING TEMPERATURE AND TIME ON THE SILICON WAFER WITH LIQUID & SOLID DOPANTS

The project is a study the behaviour of N and P-type dopant on silicon wafer by using both liquid and solid dopant sources. For P-type silicon wafer, we doped with Phosphorous while for N-type silicon wafer, we doped with Boron.

Saved in:
Bibliographic Details
Main Author: Riziana Saari (Author)
Format: Thesis Book
Subjects:
Online Access:Click Here to View Status and Holdings.
Tags: Add Tag
No Tags, Be the first to tag this record!

Similar Items