EFFECTS OF ANNEALING TEMPERATURE AND TIME ON THE SILICON WAFER WITH LIQUID & SOLID DOPANTS
The project is a study the behaviour of N and P-type dopant on silicon wafer by using both liquid and solid dopant sources. For P-type silicon wafer, we doped with Phosphorous while for N-type silicon wafer, we doped with Boron.
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| Format: | Thesis Book |
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| Online Access: | Click Here to View Status and Holdings. |
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Add Tag | Summary: | The project is a study the behaviour of N and P-type dopant on silicon wafer by using both liquid and solid dopant sources. For P-type silicon wafer, we doped with Phosphorous while for N-type silicon wafer, we doped with Boron. |
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| Item Description: | UiTM X Digitization |
| Physical Description: | xvi, 100 pages: illustrations (some color); 30 cm |
| Bibliography: | Includes bibliographical references (page 97-98) |
The mechanical properties of metals assessment and significance