INVESTIGATION ON THE COATING OF LOW REFRACTIVE INDEX QUARTER WAVELENGTH THICK SILICA AS A MATERIAL LAYER FOR DIELECTRIC MIRROR
Sol gel technique was used to form silica solution by using TEOS as precursor. The silica thin were fabricated by dip coating technique onto silicon wafer and glass substrate. The dip coating rate was investigated to achieve the exact thickness of thin film.
Saved in:
| Main Author: | |
|---|---|
| Format: | Thesis Book |
| Language: | English |
| Subjects: | |
| Online Access: | Click Here to View Status and Holdings. |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Add Tag | Summary: | Sol gel technique was used to form silica solution by using TEOS as precursor. The silica thin were fabricated by dip coating technique onto silicon wafer and glass substrate. The dip coating rate was investigated to achieve the exact thickness of thin film. |
|---|---|
| Item Description: | UiTM X Digitization |
| Physical Description: | vii, 59 pages illustrations (some color) 30 cm |
| Bibliography: | Includes bibliographical references (page 57) |
Colloidal silica fundamentals and applications 
Monolithic silicas in separation science concepts, syntheses, characterization, modeling and applications