EFFECTS OF ANNEALING TEMPERATURE AND TIME ON THE P-TYPE SILICON WAFER WITH BORON & PHOSPHORUS DOPANTS
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| Format: | Thesis |
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SHAH ALAM, SELANGOR
UNIVERSITI TEKNOLOGI MARA, FACULTY OF APPLIED SCIENCES
2010
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| Online Access: | Click Here to View Status and Holdings. |
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| 100 | 0 | # | |a NURUL NADIA CHE MANAF |e author |
| 245 | 1 | 0 | |a EFFECTS OF ANNEALING TEMPERATURE AND TIME ON THE P-TYPE SILICON WAFER WITH BORON & PHOSPHORUS DOPANTS |c NURUL NADIA CHE MANAF |
| 264 | # | 1 | |a SHAH ALAM, SELANGOR |b UNIVERSITI TEKNOLOGI MARA, FACULTY OF APPLIED SCIENCES |c 2010 |
| 500 | # | # | |a UiTM X Digitization |
| 502 | # | # | |a Student Report(BSc.)-UNIVERSITI TEKNOLOGI MARA, FACULTY OF APPLIED SCIENCES 2010 |
| 040 | # | # | |a Shah Alam |
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