EFFECT OF ANNEALING TEMPERATURE AND TIME ON BORON AND PHOSPHORUS SPIN-ON DOPANT IN N-TYPE SILICON WAFER

Saved in:
Bibliographic Details
Main Author: NOR AISYAH JAMALUDDIN (Author)
Format: Thesis
Published: Shah Alam, Selangor Universiti Teknologi MARA. Faculty of Applied Sciences 2010
Online Access:Click Here to View Status and Holdings.
Tags: Add Tag
No Tags, Be the first to tag this record!

MARC

LEADER 00000n a2200000 a 4501
001 wils-939077
005 2019228122557
100 0 # |a NOR AISYAH JAMALUDDIN  |e author 
245 1 0 |a EFFECT OF ANNEALING TEMPERATURE AND TIME ON BORON AND PHOSPHORUS SPIN-ON DOPANT IN N-TYPE SILICON WAFER  |c NOR AISYAH JAMALUDDIN 
264 # 1 |a Shah Alam, Selangor  |b Universiti Teknologi MARA. Faculty of Applied Sciences  |c 2010 
500 # # |a UiTM X Digitization 
502 # # |a Student report (BSc.)-Universiti Teknologi MARA, Faculty of Applied Sciences, 2010 
040 # # |a Shah Alam 
856 4 0 |z Click Here to View Status and Holdings.  |u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=939077 
998 # # |a 00264#1a002.8.2||00264#1b007.2||00500##a002.17.2||00502##a007.9.2||