TEMPERATURE DEPENDENCY IN THE PREPARATION OF SILICON OXIDE (SiO₂) LAYER
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| Format: | Thesis |
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SHAH ALAM, SELANGOR
UNIVERSITI TEKNOLOGI MARA. FACULTY OF APPLIED SCIENCES
2011
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| Online Access: | Click Here to View Status and Holdings. |
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| 100 | 0 | # | |a SUAZLINA MOHD ALI |e author |
| 245 | 0 | 0 | |a TEMPERATURE DEPENDENCY IN THE PREPARATION OF SILICON OXIDE (SiO₂) LAYER |c SUAZLINA MOHD ALI |
| 264 | # | 1 | |a SHAH ALAM, SELANGOR |b UNIVERSITI TEKNOLOGI MARA. FACULTY OF APPLIED SCIENCES |c 2011 |
| 500 | # | # | |a UiTM X Digitization |
| 502 | # | # | |a Student report (Bs.C)-UNIVERSITI TEKNOLOGI MARA. FACULTY OF APPLIED SCIENCES, 2011 |
| 040 | # | # | |a Shah Alam |
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