Chemical vapor deposition principles and applications

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Bibliographic Details
Other Authors:	Hitchman, Michael L, Jensen, Klavs F. 1952-
Format:	Unknown
Published:	London Academic Press 1993
Subjects:	Chemical vapor deposition
Online Access:	Click Here to View Status and Holdings.
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MARC


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001	wils-80945
020	#	#	\|a 0123496705
090	0	0	\|a TS695 \|b .C54 1993
245	1	1	\|a Chemical vapor deposition \|b principles and applications \|c edited by Michael L. Hitchman and Klavs F. Jensen
260	#	#	\|a London \|b Academic Press \|c 1993
300	#	#	\|a v, 677 p. \|b ill. \|c 24 cm
504	#	#	\|a Includes bibliographical references and index
650	#	0	\|a Chemical vapor deposition
700	1	#	\|a Hitchman, Michael L
700	#	#	\|a Jensen, Klavs F. \|c 1952-
856	4	0	\|z Click Here to View Status and Holdings. \|u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=80945
964	#	#	\|c BOK \|d 01
040	#	#	\|a Shah Alam
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