Chemical vapor deposition principles and applications
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Format: | Book |
Published: |
London
Academic Press
1993
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Online Access: | Click Here to View Status and Holdings. |
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LEADER | 00000n a2200000 a 4501 | ||
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001 | wils-80945 | ||
020 | # | # | |a 0123496705 |
090 | 0 | 0 | |a TS695 |b .C54 1993 |
245 | 1 | 1 | |a Chemical vapor deposition |b principles and applications |c edited by Michael L. Hitchman and Klavs F. Jensen |
260 | # | # | |a London |b Academic Press |c 1993 |
300 | # | # | |a v, 677 p. |b ill. |c 24 cm |
504 | # | # | |a Includes bibliographical references and index |
650 | # | 0 | |a Chemical vapor deposition |
700 | 1 | # | |a Hitchman, Michael L |
700 | # | # | |a Jensen, Klavs F. |c 1952- |
856 | 4 | 0 | |z Click Here to View Status and Holdings. |u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=80945 |
964 | # | # | |c BOK |d 01 |
040 | # | # | |a Shah Alam |
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