Reactive sputter deposition

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Bibliographic Details
Other Authors: Depla, D., Mahieu, S.
Format: Book
Published: Berlin, NY Springer 2008
Series:Springer series in materials science 109
Subjects:
Online Access:Click Here to View Status and Holdings.
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020 # # |a 3540766626 (hbk.) 
020 # # |a 9783540766629 (hbk.) 
040 # # |a DLC  |d ITMB 
090 0 0 |a TS695  |b .R43 2008 
245 0 0 |a Reactive sputter deposition  |c D. Depla, S. Mahieu, editors 
260 # # |a Berlin, NY  |b Springer  |c 2008 
300 # # |a xviii, 570 p.  |b ill. (some col.)  |c 25 cm 
490 1 # |a Springer series in materials science  |v 109 
504 # # |a Includes bibliographical references and index 
650 # 1 |a Thin films 
650 # # |a Cathode sputtering (Plating process) 
700 1 # |a Depla, D. 
700 # # |a Mahieu, S. 
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