Chemical vapour deposition precursors, processes and applications

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Bibliographic Details
Other Authors:	Jones, Anthony C., Hitchman, Michael L.
Format:	Unknown
Published:	Cambridge, UK Royal Society of Chemistry 2009
Subjects:	Chemical vapor deposition
Online Access:	Click Here to View Status and Holdings.
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020	#	#	\|a 0854044655 (hbk.)
040	#	#	\|a UKM \|d ITMB
090	0	0	\|a TS695 \|b .C67 2009
245	0	0	\|a Chemical vapour deposition \|b precursors, processes and applications \|c edited by Anthony C. Jones, Michael L. Hitchman
246	1	#	\|a Chemical vapor deposition
260	#	#	\|a Cambridge, UK \|b Royal Society of Chemistry \|c 2009
300	#	#	\|a xv, 582 p. \|b ill. (some col.), plans \|c 26 cm
504	#	#	\|a Includes bibliographical references and index
650	#	0	\|a Chemical vapor deposition
700	1	#	\|a Jones, Anthony C.
700	#	#	\|a Hitchman, Michael L.
856	4	0	\|z Click Here to View Status and Holdings. \|u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=432359
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