Chemical vapour deposition precursors, processes and applications
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Format: | Book |
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Cambridge, UK
Royal Society of Chemistry
2009
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Online Access: | Click Here to View Status and Holdings. |
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001 | wils-432359 | ||
020 | # | # | |a 9780854044658 (hbk.) |
020 | # | # | |a 0854044655 (hbk.) |
040 | # | # | |a UKM |d ITMB |
090 | 0 | 0 | |a TS695 |b .C67 2009 |
245 | 0 | 0 | |a Chemical vapour deposition |b precursors, processes and applications |c edited by Anthony C. Jones, Michael L. Hitchman |
246 | 1 | # | |a Chemical vapor deposition |
260 | # | # | |a Cambridge, UK |b Royal Society of Chemistry |c 2009 |
300 | # | # | |a xv, 582 p. |b ill. (some col.), plans |c 26 cm |
504 | # | # | |a Includes bibliographical references and index |
650 | # | 0 | |a Chemical vapor deposition |
700 | 1 | # | |a Jones, Anthony C. |
700 | # | # | |a Hitchman, Michael L. |
856 | 4 | 0 | |z Click Here to View Status and Holdings. |u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=432359 |
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