X-ray metrology in semiconductor manufacturing

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Bibliographic Details
Main Author: Bowen, D. Keit 1940- (David Keith)
Other Authors: Tanner, B. K. (Brian Keith)
Format: Unknown
Published: Boca Raton CRC/Taylor & Francis 2006
Subjects:
Online Access:Click Here to View Status and Holdings.
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020 # # |a 0849339286 (alk. paper) 
090 0 0 |a TK7874.58  |b .B69 2006 
100 1 # |a Bowen, D. Keit  |c 1940-  |q (David Keith) 
245 1 1 |a X-ray metrology in semiconductor manufacturing  |c D. Keith Bowen, Brian K. Tanner 
260 # # |a Boca Raton  |b CRC/Taylor & Francis  |c 2006 
300 # # |a 279 p.  |b ill.  |c 25 cm 
504 # # |a Includes bibliographical references and index 
650 # 0 |a Semiconductors  |x Design and construction  |x Quality control 
650 # 0 |a Integrated circuits  |x Measurement 
650 # 0 |a Semiconductor wafers  |x Inspection 
650 # 0 |a Fluroscopy 
650 # 0 |a X-rays  |x Diffraction 
700 1 # |a Tanner, B. K.  |q (Brian Keith) 
856 4 0 |z Click Here to View Status and Holdings.  |u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=348886 
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