Chemical vapor deposition thermal and plasma deposition of electronic materials
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Format: | Book |
Published: |
New York
Van Nostrand Reinhold
1995
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Online Access: | Click Here to View Status and Holdings. |
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LEADER | 00000n a2200000 a 4501 | ||
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001 | wils-328985 | ||
020 | # | # | |a 0442010796 |
090 | 0 | 0 | |a TK7836.S54 1995 |
100 | 1 | # | |a Sivaram, S |
245 | 1 | 1 | |a Chemical vapor deposition |b thermal and plasma deposition of electronic materials |
260 | # | # | |a New York |b Van Nostrand Reinhold |c 1995 |
300 | # | # | |a xii, 292 |b ill. |c 24 cm |
504 | # | # | |a Includes bibliographical references and index |
650 | # | 0 | |a Chemical vapor deposition |
650 | # | 0 | |a Microelectronics |x Materials |
650 | # | 0 | |a Microelectronics industry |
856 | 4 | 0 | |z Click Here to View Status and Holdings. |u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=328985 |
964 | # | # | |c BOK |d 01 |
040 | # | # | |a Shah Alam |