Lithographic technology in transition
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Main Author: | |
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Other Authors: | , |
Format: | Book |
Published: |
Albany, New York
Delmar Publ.
1997
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Subjects: | |
Online Access: | Click Here to View Status and Holdings. |
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LEADER | 00000n a2200000 a 4501 | ||
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001 | wils-214340 | ||
020 | # | # | |a 0827361246 |
090 | 0 | 0 | |a Z252.5.05 |b D44 1997 |
100 | 1 | # | |a Dennis, Ervin A. |
245 | 1 | 1 | |a Lithographic technology in transition |c Ervin A. Dennis, Olusegun Odesina, Daniel G. Wilson |
260 | # | # | |a Albany, New York |b Delmar Publ. |c 1997 |
300 | # | # | |a xi, 626 p. |b ill. [some col.] |c 27 cm |
500 | # | # | |a Includes index |
650 | # | 0 | |a Lithography |
650 | # | 0 | |a Offset lithography |
700 | 1 | # | |a Odesina, Olusegun |
700 | # | # | |a Wilson, Daniel G. |
856 | 4 | 0 | |z Click Here to View Status and Holdings. |u https://opac.uitm.edu.my/opac/detailsPage/detailsHome.jsp?tid=214340 |
964 | # | # | |c BOK |d 01 |
040 | # | # | |a Shah Alam |
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