HANDBOOK OF ADVANCED SEMICONDUCTOR TECHNOLOGY AND COMPUTER SYSTEMS
Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. The main advantage of PECVD stems fro...
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| Format: | Book |
| Language: | English |
| Published: |
New York
Van Nostrand Reinhold Co.
1988
©1988 |
| Series: | Van Nostrand Reinhold electrical/computer science and engineering series
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| Online Access: | Click Here to View Status and Holdings. |
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THE ESSENTIAL GUIDE TO SEMICONDUCTORS