HANDBOOK OF ADVANCED SEMICONDUCTOR TECHNOLOGY AND COMPUTER SYSTEMS

HANDBOOK OF ADVANCED SEMICONDUCTOR TECHNOLOGY AND COMPUTER SYSTEMS

Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. The main advantage of PECVD stems fro...

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Bibliographic Details
Other Authors: Rabbat, Guy
Format: Book
Language:English
Published: New York Van Nostrand Reinhold Co. 1988
©1988
Series:Van Nostrand Reinhold electrical/computer science and engineering series
Subjects:
Integrated circuits > Design and construction
Electronic digital computers > Circuits > Design and construction
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